| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a heat developable photosensitive material having good moisture resistance and improved scuffing and wear resistances, and to provide a heat developable photosensitive material manufactured by the method. SOLUTION: In the method for manufacturing the heat developable photosensitive material, a coating liquid containing organic silver salt particles, silver halide grains and a reducing agent is applied and dried on a support to form a photosensitive layer, the outermost layer on the photosensitive layer side is provided by applying and drying a coating liquid containing a latex and a wax emulsion, and heat treatment is carried out in a roll shape. Alternatively, in the method for manufacturing the heat developable photosensitive material, a coating liquid containing organic silver salt particles, silver halide grains and a reducing agent is applied and dried on a support to form a photosensitive layer, the outermost layer on the photosensitive layer side is provided by applying and drying a coating liquid containing a latex and a wax emulsion, and heat treatment is carried out under line conveyance. COPYRIGHT: (C)2006,JPO&NCIPI
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