| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method which enables to manufacture a micro high purity metal oxide at a low cost. <P>SOLUTION: This method of manufacturing a micro high purity metal oxide including few impure metal components includes a process in which microbes combinable with the impure metal components are brought into contact with the metal oxide; a process for adding a biocide; a process for forming flocs of the metal oxide containing the impure metal components and the microbes; and a process for removing the flocs. The micro high purity metal oxide of this invention contains a very small amount of metal impure matters, and is useful for the polishing work for electronic materials such as silicon wafers, compound semiconductor wafers, semiconductor device wafers, magnetic disk substrates, and crystal substrates. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
