发明名称 ELECTRODE STRUCTURE OF PLASMA TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To assure an uniformity of a surface treatment by reducing an amount of bending by a coulomb force of an electrode in a plasma treatment device for a large area treatment object. <P>SOLUTION: An electrode structure 30X of the plasma treatment device consists of a pair of electrode rows 31X, 32X extending side by side and facing back and forth each other. Each electrode row is structured with a plurality of electrode members 31A to 32C put in order side by side, a gap 33p between rows having inverse polarities respectively between electrode members of an electrode row and the other electrode row arranged at the same position in a right and left direction substantially is formed between mutual facing surfaces. Furthermore, the polarity of electrode members to be adjacent with each other in each electrode row is mutually reversed. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005302685(A) 申请公布日期 2005.10.27
申请号 JP20040214182 申请日期 2004.07.22
申请人 SEKISUI CHEM CO LTD 发明人 UEHARA TAKESHI;ONO TSUYOSHI;ITO TAKUMI;TAKEUCHI HIROTO
分类号 H05H1/24;H01L21/205 主分类号 H05H1/24
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