MEASURING DEVICE, MEASURING METHOD, ALIGNER AND EXPOSURE METHOD HAVING THE SAME, AND METHOD FOR MANUFACTURING DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a measuring device and a measuring method by which the aberration of an optical system to be inspected can be precisely measured, and to provide an aligner and an exposure method by which high-resolution exposure can be realized.

SOLUTION: The measuring device is provided with a first measuring means wherein an optical element is used to divide a flux of light so that the optical performance of an optical system to be inspected can be measured, and a second measuring means to the optical performance of the optical element.

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