发明名称 SOLID-SATETE IMAGING ELEMENT AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a sold-state imaging element capable of suppressing a dark current and a defect of pixel. <P>SOLUTION: A plurality of photoelectric conversion element 4 are formed in a semiconductor substrate 1, and circuits 5 for reading out a signal charge from the plurality of photoelectric conversion element 4 are respectively formed on the semiconductor substrate 1. The solid-state imaging element 10 to which a light is irradiated from the opposite side of the circuits 5 for reading out the signal charge from the plurality of photoelectric conversion element is formed, and a gettering region 15 is provided to an element separating regiuon 2 for eparating the adjacent photoelectric conversion element 4. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2005294705(A) 申请公布日期 2005.10.20
申请号 JP20040110305 申请日期 2004.04.02
申请人 SONY CORP 发明人 EZAKI TAKAYUKI;HIRAYAMA TERUMINE;KANBE HIDEO
分类号 H01L27/146;H01L31/0328;H04N5/335;H04N5/361;H04N5/367;H04N5/369;H04N5/374;(IPC1-7):H01L27/146 主分类号 H01L27/146
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