发明名称 THERMAL OXIDATION METHOD, PIEZOELECTRIC ACTUATOR WITH SUBSTRATE FORMED THEREBY, AND LIQUID INJECTION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a thermal oxidation method in order to stabilize the adhesion of a metallic oxide film and an underlying layer. <P>SOLUTION: The thermal oxidation method is performed such that two or more substrates 14 are fixed to a jig 12, and supplied to a thermal oxidation furnace 10, in order to form a metallic oxide film by oxidizing the metal film on the surface of a substrate. The distance between the substrates fixed to the jig is set at least 1/4 or more of the substrate diameter. The metal film comprises one of zirconium, aluminum, and titanium. It is preferable that the transfer speed is preferably 200 mm/minute or more at the time of supplying the jig to the thermal oxidation furnace. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005294438(A) 申请公布日期 2005.10.20
申请号 JP20040105641 申请日期 2004.03.31
申请人 SEIKO EPSON CORP 发明人 MURAI MASAMI;ITO MAKI
分类号 B41J2/16;B05C5/00;B41J2/14;B41J2/145;H01L41/09;H01L41/187;H01L41/22 主分类号 B41J2/16
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