| 摘要 |
PROBLEM TO BE SOLVED: To provide an aerosol deposition apparatus capable of performing film deposition while maintaining a stable concentration of aerosol. SOLUTION: The aerosol deposition apparatus comprises a gas feeding means, a vessel 14 which is connected to the gas feeding means, contains particulates and forms the aerosol dispersed with the particulates dispersed in gas, a chamber 18 which is connected to the vessel and has a nozzle 16 for ejecting the aerosol toward a substrate, a means 66 which ionizes the aerosol, and a means 68 which applies a bias voltage of a code reverse to the code of the ion of the aerosol to the substrate 36. COPYRIGHT: (C)2006,JPO&NCIPI
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