发明名称 |
Method and system for measurement of dielectric constant of thin films using a near field microwave probe |
摘要 |
A measurement technique based on a microwave near-field scanning probe is developed for non-contact measurement of dielectric constant of low-k films. The technique is non-destructive, non-invasive and can be used on both porous and non-porous dielectrics. The technique is based on measurement of resonant frequency shift of the near-field microwave resonator for a plurality of calibration samples vs. distance between the probe tip and the sample to construct a calibration curve. Probe resonance frequency shift measured for the sample under study vs. tip-sample separation is fitted into the calibration curve to extract the dielectric constant of the sample under study. The calibration permits obtaining a linear calibration curve in order to simplify the extraction of the dielectric constant of the sample under study.
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申请公布号 |
US2005230619(A1) |
申请公布日期 |
2005.10.20 |
申请号 |
US20050101517 |
申请日期 |
2005.04.08 |
申请人 |
TALANOV VLADIMIR V;SCHWARTZ ANDREW R;SCHERZ ANDRE;MORELAND ROBERT L |
发明人 |
TALANOV VLADIMIR V.;SCHWARTZ ANDREW R.;SCHERZ ANDRE;MORELAND ROBERT L. |
分类号 |
G01N23/00;G01Q10/00;G01Q60/18;G01Q60/22;G01R27/26;(IPC1-7):G01N23/00 |
主分类号 |
G01N23/00 |
代理机构 |
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