发明名称 HIGH Q INDUCTOR WITH FARADAY SHIELD AND DIELECTRIC WELL BURIED IN SUBSTRATE
摘要 Inductor losses to a semiconducting substrate are eliminated in an IC structure by etching a well into the substrate down to the insulating layer coating the substrate and fabricating a grounded Faraday shield in the shape of elongated segments in the bottom of the well. The well lies directly below the inductor and is optionally filled with cured low-k organic dielectric or air.
申请公布号 KR100522655(B1) 申请公布日期 2005.10.19
申请号 KR20037009973 申请日期 2003.07.28
申请人 发明人
分类号 H01L27/04;(IPC1-7):H01L27/04 主分类号 H01L27/04
代理机构 代理人
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