| 摘要 |
The proposed device for determining the instant of the termination of plasma etching process contains a laser, a condenser, a rotary reflector, a diaphragm, a plasma chamber with an optical window, and a photoelectric converter. The photoelectric converter contains a photodiode, a resistor, a bipolar transistor, a field-effect transistor, an inductance coil, a capacitor, and two direct voltage sources. The first terminal of the first direct voltage source is connected to the base of the bipolar transistor. The emitter of the bipolar transistor is connected to the source and substrate of the field-effect transistor, and the collector is connected to the first terminal of the photodiode, the first terminal of the resistor, the first terminal of the inductance coil, and the first output terminal of the proposed device. The second terminal of the photodiode and the second terminal of the resistor are connected to the gate of the field-effect transistor. The second terminal of the inductance coil is connected to the first terminal of the capacitor and the first terminal of the second direct voltage source. The second terminal of the second direct voltage source is connected to the second terminal of the capacitor, the second terminal of the first direct voltage source, and the second output terminal of the proposed device.
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