发明名称 FABRICATION METHOD FOR AN INTERCONNECT ON A SUBSTRATE
摘要 <p>Method for fabricating an interconnect on a substrate. The method includes applying a mask on the substrate, patterning the mask, so that it has an opening corresponding to the interconnect, providing the interconnect in the opening on the substrate, widening the opening in order to uncover a region laterally adjoining the interconnect, encapsulating of interconnect in the widened opening, andremoving the mask.</p>
申请公布号 KR100519893(B1) 申请公布日期 2005.10.13
申请号 KR20020070969 申请日期 2002.11.15
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分类号 H01L23/52;H01L21/311;H01L21/4763;H01L21/60;H01L21/768;H01L23/485;(IPC1-7):H01L23/52 主分类号 H01L23/52
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