| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cyanoadamantyl compound, to provide a polymer, and to provide a photoresist containing the same. <P>SOLUTION: The cyanoadamantyl compound of formula I [R, R<SP>1</SP>are H or an alkyl; R<SP>3</SP>is cyano, hydroxy, or an arbitrarily substituted alkyl, provided that at least one of R<SP>3</SP>groups is a cynoalkyl or a cyanoheteroalkyl; W is a chemical bond or a quaternary carbon-containing group; (n) is an integer of 1 to 4]. The polymer comprising the polymerization units of the compound. A photoresist composition contains the polymer. A preferable polymer is used in photoresists which form images with light having shorter wavelengths than 250 nm, such as 248 nm and 193 nm. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
