Device and method for maskless afm microlithography

摘要

The invention relates to a device and a method for maskless microlithography. Several microstructured cantilevers ( 2 ) are arranged in an array ( 26 ) and an actuator is integrated in each of the cantilevers ( 2 ) of the array ( 26 ). A power supply and control unit ( 24 ) is provided, said unit adjusting the distance of the cantilevers ( 6 ) relative to a surface ( 4 ) that is to be structured by means of an appropriate voltage. Every point of the needles ( 6 ) is connected to said power supply and control unit ( 24 ). In order to implement the inventive method, an array ( 26 ) with cantilevers, each of which carries a point of a needle ( 6 ), is brought into contact with a surface ( 4 ) to be structured in such a way that the points of the needles ( 6 ) are arranged close to the surface ( 4 ) to be structured.