| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dye pattern forming method by which a dye pattern tightly adhering to a substrate and having high absorption strength per unit film thickness can easily be formed, and to provide a dye pattern excellent in film strength and having high absorption strength per unit film thickness. <P>SOLUTION: The dye pattern forming method comprises a step of forming a polymerization initiation layer on a support by fixing a polymer having a functional group having polymerization initiating ability and a crosslinking group in a side chain through a crosslinking reaction, and a step of patternwise forming a graft polymer having a dye skeleton within a molecule only in an energy applied region by applying energy to a surface of the polymerization initiation layer and using produced active sites as base points. By the method, the dye pattern is obtained which has on a support a polymerization initiation layer having polymerization initiating ability at a side chain and having a crosslinked structure, and a patterned graft polymer layer bonding directly to a surface of the polymerization initiation layer and having a dye skeleton. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
