发明名称 |
METHOD FOR FORMING HOLE AND METHOD FOR MANUFACTURING MAGNETORESISTANCE EFFECT ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive manufacturing method. <P>SOLUTION: This method for forming holes comprises: a step of forming an organic polymer film consisting of a plurality of phases dispersion-precipitated in a flat surface on a member in which holes should be formed; a step of altering the molecular structure of the precipitated phase of prescribed parts of the organic polymer film by irradiating the precipitated phase with an electron beam; a step of selectively removing the precipitated phase whose molecular structure has been altered in a solution; and a step of forming the holes by etching the member in which the holes should be formed using the organic polymer film from which the precipitated phase has been selectively removed as a mask. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2005284100(A) |
申请公布日期 |
2005.10.13 |
申请号 |
JP20040099821 |
申请日期 |
2004.03.30 |
申请人 |
TOSHIBA CORP |
发明人 |
OSAWA YUICHI;ASAKAWA KOUJI;NAKAMURA SHIHO;SAKURAI MASATOSHI |
分类号 |
G03F7/039;H01L43/08;H01L43/12 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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