发明名称 METHOD FOR FORMING HOLE AND METHOD FOR MANUFACTURING MAGNETORESISTANCE EFFECT ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide an inexpensive manufacturing method. <P>SOLUTION: This method for forming holes comprises: a step of forming an organic polymer film consisting of a plurality of phases dispersion-precipitated in a flat surface on a member in which holes should be formed; a step of altering the molecular structure of the precipitated phase of prescribed parts of the organic polymer film by irradiating the precipitated phase with an electron beam; a step of selectively removing the precipitated phase whose molecular structure has been altered in a solution; and a step of forming the holes by etching the member in which the holes should be formed using the organic polymer film from which the precipitated phase has been selectively removed as a mask. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005284100(A) 申请公布日期 2005.10.13
申请号 JP20040099821 申请日期 2004.03.30
申请人 TOSHIBA CORP 发明人 OSAWA YUICHI;ASAKAWA KOUJI;NAKAMURA SHIHO;SAKURAI MASATOSHI
分类号 G03F7/039;H01L43/08;H01L43/12 主分类号 G03F7/039
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