| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering apparatus which can perform reactive sputtering for a long time with a good yield. SOLUTION: The sputtering apparatus is equipped with a means for monitoring the state of a target 3 and shuts off electric power for deposition to be applied to the target 3 when the state thereof attains the prescribed state. Since the apparatus can substantially prevent the abnormal discharge due to a change in the state of the target 3, the reactive sputtering can be performed with the good yield for a long time. COPYRIGHT: (C)2006,JPO&NCIPI
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