发明名称 Semiconductor on insulator substrate and devices formed therefrom
摘要 A semiconductor on insulator (SOI) device is comprised of a layer of a dielectric material having a perovskite lattice, such as a rare earth scandate. The dielectric material is selected to have an effective lattice constant that enables growth of semiconductor material having a diamond lattice directly on the dielectric. Examples of the rare earth scandate dielectric include gadolinium scandate (GdScO<SUB>3</SUB>), dysprosium scandate (DyScO<SUB>3</SUB>), and alloys of gadolinium and dysprosium scandate (Gd<SUB>1-x</SUB>Dy<SUB>x</SUB>ScO<SUB>3</SUB>).
申请公布号 US2005224879(A1) 申请公布日期 2005.10.13
申请号 US20040819441 申请日期 2004.04.07
申请人 ADVANCED MICRO DEVICES, INC. 发明人 XIANG QI
分类号 H01L29/786;(IPC1-7):H01L27/01 主分类号 H01L29/786
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