SUBSTRATE HOLDING MECHANISM, AND SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a substrate holding mechanism having a mirror plane opposite to a substrate and including a spin base which essentially requires no reworking, and also to provide a substrate treatment apparatus and a substrate treatment method using the same. SOLUTION: A spin chuck 1 is composed of the spin base 11 and substrate holding pins 12. A rotary shaft 21 which is rotated by a rotation driving mechanism 2 is connected to the bottom surface of the spin base 11. A treatment liquid is supplied to the substrate S held by the spin chuck 1 from a top face treatment liquid supplying mechanism 3 and a bottom face treatment liquid supplying mechanism 4. The spin base 11 is formed of a silicon carbide material containing no metal assistant, and its surface including the plane 11a opposite to the substrate is mirror-finished. COPYRIGHT: (C)2006,JPO&NCIPI