发明名称 |
Projection objective for immersion lithography |
摘要 |
In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
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申请公布号 |
US2005225737(A1) |
申请公布日期 |
2005.10.13 |
申请号 |
US20040015553 |
申请日期 |
2004.12.20 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
WEISSENRIEDER KARL-STEFAN;HIRNET ALEXANDER;PAZIDIS ALEXANDRA;SCHUSTER KARL-HEINZ;ZACZEK CHRISTOPH;LILL MICHAEL;SCHEIBLE PATRICK;SCHINK HARALD;BROTSACK MARKUS;LOERING ULRICH;GRUNER TORALF;SCHEIBLE GUENTER |
分类号 |
G03B27/42;G03F7/20;(IPC1-7):G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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