TWO-STAGE ETCHING PROCESS FOR PRODUCING AN INTEGRATED CIRCUIT ARRANGEMENT, IN PARTICULAR COMPRISING A CAPACITOR ASSEMBLY

摘要

A method for production of an integrated circuit arrangement which contains a capacitor. A dielectric layer is structured with the aid of a two-stage etching process, and with the aid of a hard mask. In the case of an electrically insulating hard mask, the hard mask is removed again. In the case of an electrically conductive hard mask, parts of the hard mask may remain in the circuit arrangement.