| 摘要 |
FIELD: optics, holography. ^ SUBSTANCE: method includes production of image in form of multiple added zones of overlapping of illuminated areas, in which dose of emission equals to or exceeds the threshold value. During exposure matrix of emitters or/and sensitive material is moved for distance, not exceeding maximal characteristic size d of illumination areas, altering size of area of overlapping with discrete value, determined by shift step, selected from range from 0,01 nm to d. during production of binary holograms on surface of film of non-transparent material sensitive material is positioned, and after production of image on it by said means or by means of emitters matrix, made in form of sources of corpuscular particles beams, moved with step, selected from range from 0,01 nm to d2, where d2 - maximal characteristic size of formed gating areas, in the film multiple gating areas are formed. Binary hologram is used during production of image, it is positioned with possible step-wise movement in direction, perpendicular to surface of material sensitive to used emission with step from 0,01 nm to Deltas, where Deltas is value of change of distance between material sensitive to used type of emission and binary hologram, at which resolution of image, formed by hologram, decreases by 20%. ^ EFFECT: simplified construction, lower laboriousness, higher quality, higher efficiency. ^ 4 cl, 8 dwg |
