发明名称 YIELD ANALYZER AND YIELD ANALYTICAL METHOD
摘要 PROBLEM TO BE SOLVED: To definitely estimate a device that deteriorates a yield and to further estimate a sensor value that is estimated to be abnormal. SOLUTION: Injected wafers 20 are processed by lot unit by a processing device and are stored in a progress control DB3. The inspection results that a product inspection is conducted in an inspection process after the processing are stored in an inspection result DB1. Sensor outputs that sense information showing the operation condition of a device are outputted from the processing device and are accumulated in a device monitoring DB6. In addition, sensor outputs are inputted into a monitoring data monitoring computer 5 connected to the device monitoring DB6 to obtain the information on the monitored data in the past. The system obtains yield analytical results in a yield analytical computer 2 of the inspection result DB1 and progress control information of the processing device from a progress control computer 4 of the progress control DB3, and estimates the device where a yield deteriorates with a yield analytical computer 8. The estimated device estimates the fluctuations of a sensor output showing the operation condition that has processed wafers, and estimates the operation condition of the device from the yield of the wafers. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005277290(A) 申请公布日期 2005.10.06
申请号 JP20040091716 申请日期 2004.03.26
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAKAMI HITOSHI
分类号 H01L21/66;H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/66
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