| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with which it is possible to form a high resolution resist pattern with low line edge roughness, and which is used as an upper layer resist of a two layer resist process and a method for forming the resist pattern. <P>SOLUTION: The photosensitive resin composition used for the upper layer of the two layer resist, which has high resolution and of which the aspect is heightened, is constructed by including a compound containing each of at least one or more polymerizable functional group and one or more silicon atom in the molecule as a component (A), and a photopolymerization initiator containing each of at least one or more polymerizable functional group and one or more silicon atom in the molecule as a component (B). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
