| 摘要 |
PROBLEM TO BE SOLVED: To provide a functional water manufacturing apparatus by which gas is quickly swept from a gas dissolving unit, kind of functional water can be quickly changed-over by one set of the gas dissolving unit, and equipment/operation cost is suppressed. SOLUTION: The functional water manufacturing apparatus 1 is provided with a two or more kinds of gas supply means 2, a gas dissolving means 5 having a diffusion membrane 5a with no opening through which gas G permeates by diffusion and bringing the gas G supplied by the supply means 2 into contact with pure water W across the diffusion membrane 5a to dissolve the gas G in the pure water W and a sweeping gas supply means 6 for supplying sweeping gas to the flow passage 5c of the gas G of the gas dissolving means 5. In the gas dissolving means 5, preferably the gas W comes into contact with the pure water W with counter current flow and the sweeping gas supplied from the sweeping gas supply means 6 flows in the flow passage of the gas G so as to form a concurrent flow with the pure water W. The gas supplied from the supply means 2 is oxygen, hydrogen, ozone, nitrogen, carbon dioxide or the like and manufactured functional water can be utilized for semiconductor manufacturing equipment or the like. COPYRIGHT: (C)2006,JPO&NCIPI
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