| 摘要 |
To control the gap length in the near-field area with a high accuracy, the exposure apparatus (10) includes an exposure light source (11) to emit an exposure laser light, a gap length controlling light source (16) to emit a gap length controlling laser light different in wavelength from the exposure laser light (11), a condenser lens (17a), collimator lens (17b) and a dichroic mirror (12) to project the gap length controlling laser light to a condenser lens (14) and solid immersion lens SIL (15), and a photodetector (22) to detect the intensity of a return part of the gap length controlling laser light from an outgoing surface (15b) of the SIL (15). Thus in the exposure apparatus (10), the gap between the SIL (15) and object (100) is controlled based on the detected return light intensity from the photodetector (22). <IMAGE> |
