| 摘要 |
The present invention provides a method of manufacturing a PDP that prevents defects due to dust adhering to a photomask, for example, from occurring in a structure of the PDP. In photolithography, exposure is performed twice in a same process, and photomask ( 22 ) is moved within an allowable range of displacement in an exposure pattern, between a first and a second exposures. Photomask ( 22 ) is exposed twice in total before and after moving photomask ( 22 ). Region ( 21 a), an unexposed region due to interruption of dust ( 22 b) attached to photomask ( 22 ), can be suppressed, enabling pattern exposure on photosensitive Ag paste film ( 21 ) to be favorably performed.
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