发明名称 |
Feed-through process and amplifier with feed-through |
摘要 |
The invention concerns a process for generating a feed-through in a semiconductor wafer, which has electric circuitry embedded in a front surface whereby the hole for the feed-through is generated by the combined use of a front side protection layer and a wet KOH etch process etching the hole from the back side of the wafer, where a photomasking process is subsequently used do define the via followed by deposition of the via material.
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申请公布号 |
US2005215054(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
US20050516886 |
申请日期 |
2005.06.14 |
申请人 |
RASMUSSEN FRANK E;SKINDHOJ JORGEN;PETERSEN ANDERS E |
发明人 |
RASMUSSEN FRANK E.;SKINDHOJ JORGEN;PETERSEN ANDERS E. |
分类号 |
H01L21/306;H01L21/768;(IPC1-7):H01L21/308;H01L29/40 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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