发明名称 |
ATOM PROBE EQUIPMENT AND PRELIMINARY PROCESSING METHOD FOR SAMPLE BY IT |
摘要 |
<p>A preliminary processing technology for a sample which locally cuts out the part of a device to be analyzed and processing it into a needle-like projection, and a technology of realizing SAP analysis on an atomic level by ensuring stabilized ion evaporation sequentially even in the case of a sample of multilayer structure including an element layer of small evaporation electric field in a situation described below. The preliminary processing method for a sample used on atom probe equipment comprises a step for cutting the desired observing part of the sample into a block using an FIB equipment, a step for transferring the sample cut into a block onto a sample substrate and fixing the sample in place, and a step for processing the block-like sample fixed onto the sample substrate into a needle-point shape by FIB etching. The sample processed into a needle-point shape is shaped such that the layer direction of the multilayer structure becomes parallel with the longitudinal direction of the needle.</p> |
申请公布号 |
WO2005090941(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
WO2005JP03495 |
申请日期 |
2005.03.02 |
申请人 |
SII NANOTECHNOLOGY INC.;KAITO, TAKASHI |
发明人 |
KAITO, TAKASHI |
分类号 |
G01N1/32;(IPC1-7):G01N1/32 |
主分类号 |
G01N1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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