SURFACE TREATING AGENT FOR SUBSTRATE FOR USE IN LITHOGRAPHY

摘要

A surface treating agent for use in manufacturing a substrate having a pattern composed of a plurality of regions having different surface free energies by the use of the lithography method, which comprises at least one compound selected from the group consisting of the fluorine-containing compounds having a fluoroalkyl group having one to five carbon atoms or a perfluoropolyether moiety having a molecular weight of 1000 or less. The above surface treating agent can be suitably used for shortening the irradiation time required for patterning a coating film of a surface treating agent by the lithography method.