| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic printing plate comprising a base and a photosetting polymer resist (for example, essentially comprising a free-radical initiated photosetting mechanism). <P>SOLUTION: An embodiment of the printing plate is further provided with a free-radical regulating system so as to suppress detrimental and undesired activity of excess free radicals. In a particular embodiment, the free-radical regulating system is provided as an overcoat, which is a light transmitting overcoat and comprises a polymer having a pendant free-radical trapping group. A particular polymer for the overcoat is expressed by formula (a), wherein m ranges from approximately 20 wt.% to approximately 95 wt.%, and n ranges from approximately 0 wt.% to approximately 75 wt.%. The polymer which can deactivate active free radicals generated in the photoresist after exposure is soluble in a fountain or ink solution and incompatible with the photoresist. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
