| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an optical element, provided with a low refractive index layer which can be formed to be a film of equal thickness and large area, and to provide an optical element manufactured by this method. <P>SOLUTION: In the optical element 1, one surface 2a of a light transmissive base material 2 is formed to be an uneveness surface 2b, and the low-refractive index layer 3, where a charged layer having positive charge and that having negative charge are laminated alternately and whose refractive index is lower than that of the light transmissive base material 2 is formed on the uneveness surface 2b. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
