| 发明名称 |
Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device |
| 摘要 |
In an ultrasonic washing method of washing a thing to be washed by supplying ultrasonic-wave-applied cleaning fluid to the thing, the ultrasonic wave is applied to the cleaning fluid in such a manner that the ultrasonic wave is turned on and off repeatedly at specific time intervals.
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| 申请公布号 |
US2005205109(A1) |
申请公布日期 |
2005.09.22 |
| 申请号 |
US20040968358 |
申请日期 |
2004.10.20 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
HAYAMIZU NAOYA |
| 分类号 |
H01L21/304;B08B3/02;B08B3/12;G02F1/1333;H01L21/02;H01L21/306;H01L21/3213;(IPC1-7):B08B3/12 |
主分类号 |
H01L21/304 |
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