| 发明名称 |
MEMBER FOR PLASMA PROCESSING APPARATUS |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a member for a plasma processing apparatus that is excellently anticorrosive against plasma processing carried out by using halogen-based anticorrosive gas as a raw material. <P>SOLUTION: The member for the plasma processing apparatus is used for the plasma processing apparatus, and includes a base material 10, a metal coating layer 13 which is formed on a surface of the base material by plating processing, and a metallized coating layer 14 formed on the metal coating layer surface. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005260046(A) |
申请公布日期 |
2005.09.22 |
| 申请号 |
JP20040070646 |
申请日期 |
2004.03.12 |
| 申请人 |
MITSUI ENG & SHIPBUILD CO LTD |
发明人 |
NOBUNAGA HISASHI;OISHI TAKANOBU |
| 分类号 |
H05H1/46;C22C19/03;C23C4/10;C23C28/02;C25D15/02;H01L21/205;H01L21/3065 |
主分类号 |
H05H1/46 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
