发明名称 VACUUM PROCESSING APPARATUS AND TRANSFER PROCESSING METHOD OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus and a vacuum processing method which realize high productive efficiency in a transport system for a vacuum processing device, having a plurality of vacuum processing chambers. SOLUTION: The vacuum processing apparatus is provided with a cassette table 2 which keeps a substrate to be placed in a cassettes 1 horizontally, a first transfer apparatus 13 arranged so as to be accessible to a plurality of cassettes 1 on the cassette table 2 and to a substrate-receiving chamber 5 or a substrate removing chamber 6, respectively, a transfer chamber 16 which is configured so as to be connectable to the substrate-receiving chamber 5 and the substrate removal chamber 6, as well as to a plurality of vacuum processing chambers 11 at the periphery, and a second transfer apparatus which is provided in the transfer chamber 16 and is arranged so as to be accessible to all of the substrate receiving chamber 5, the substrate removal chamber 6 and a plurality of the vacuum processing chambers 11. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005260274(A) 申请公布日期 2005.09.22
申请号 JP20050135694 申请日期 2005.05.09
申请人 HITACHI LTD 发明人 KATO SHIGEKAZU;NISHIHATA KOJI;TSUBONE TSUNEHIKO;ITO ATSUSHI
分类号 C23C16/44;H01L21/3065;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 C23C16/44
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