发明名称 Lithographic apparatus and methods for use thereof
摘要 A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.
申请公布号 US2005206879(A1) 申请公布日期 2005.09.22
申请号 US20040014062 申请日期 2004.12.17
申请人 ASML NETHERLANDS B.V. 发明人 VAN DIJK REMCO M.;FLAGELLO DONIS G.;KLAASSEN MICHEL F.H.;UITTERDIJK TAMMO
分类号 G01M11/00;G01J1/00;G01J4/04;G03F1/14;G03F7/20;H01L21/027;(IPC1-7):G01J1/00 主分类号 G01M11/00
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