发明名称 |
PHOTORESIST COMPOSITION, METHOD FOR FORMING SPACER FOR LIQUID CRYSTAL PANEL, SPACER FOR LIQUID CRYSTAL PANEL, AND LIQUID CRYSTAL PANEL |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique by which good adhesiveness to beads is ensured and occurrence of resist residue is suppressed, with respect to a technique for selectively forming beads for spacers on a substrate. <P>SOLUTION: Beads are stuck on a black matrix pattern of a substrate by using a photoresist composition containing a reaction product of (A) an alkali-soluble resin with (B) a compound represented by formula (I) [where R<SP>1</SP>denotes an alkylene group or a group represented by formula (II) (where R<SP>2</SP>denotes an alkylene group; and m represents 0 or 1)]; (C) a compound which generates an acid component upon irradiation with a radiation; and (D) beads. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005258173(A) |
申请公布日期 |
2005.09.22 |
申请号 |
JP20040070953 |
申请日期 |
2004.03.12 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
AOKI TOMOSABURO |
分类号 |
G03F7/039;C08F2/44;C08F291/00;G02F1/1339;G03F7/004;G03F7/38 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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