| 摘要 |
A transfer robot of semiconductor manufacturing equipment has the ability to sense the relative position of a wafer transferred by the robot so that the wafer can be aligned for processing. The semiconductor manufacturing equipment includes at least one load lock chamber, a transfer chamber in which the transfer robot is disposed, and at least one process chamber, e.g., an etching chamber and a stripping chamber. The transfer robot transfers wafers from a load lock chamber directly to the etching chamber through the transfer chamber, from the etching chamber to the stripping chamber, and from the stripping chamber to a load lock chamber. The blade of the transfer robot has an array of contact sensors by which the relative position of the wafer can be sensed such that a separate orienting device is not necessary. Hence, the etching process can be carried out in a relatively short time.
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