| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a fine pitch of interference fringes in an arc MLA (microlens array) although it is produced by etching. <P>SOLUTION: A transmittance controlling type mask for forming a three-dimensional profile is used to produce a three-dimensional optical element profile of a photosensitive material by film thickness distribution after development of the photosensitive material depending on exposure quantity. The mask has at least two basic patterns repeated corresponding to the basic pattern profile, in which the basic patterns on the mask are classified into at least two or more groups, and the profile of the photosensitive material is relatively shifted in the height direction in each group to design the transmittance. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
