发明名称 LASER EXPOSURE DEVICE AND LASER EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a laser exposure device which has a function of inputting/displaying a optical path diagram when an optical element is set and facilitates parameter setting and operation in the form of the optical diagram. <P>SOLUTION: The laser exposure device 3 is provided with an optical path diagram type GUI setting/determination part 2. In the optical path diagram type GUI setting/determination part 2, when an optical element controlling light quantity of irradiation light and its condition are set and an optical path is created, an optical element and its condition of a setting object of a laser control part 8 are selected in the optical path diagram while displaying the optical path diagram of irradiation light on a display device 1a as graphical user interface (GUI), and thus the selected optical element and its condition are set and it is determined whether the arrangement of the set optical element and its condition in the optical path diagram is appropriate or not when they are arranged in the diagram. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005259199(A) 申请公布日期 2005.09.22
申请号 JP20040065902 申请日期 2004.03.09
申请人 SONY CORP 发明人 MUKAI NOBUHIKO;TAKASHIMA KAZUO;HARADA MITSUO
分类号 G03F7/20;G06F3/00;G06F3/048;G11B7/135;G11B7/26;G11B11/105 主分类号 G03F7/20
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