| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a processing apparatus of a lithographic plate for developing lithography, having photosensitivity and thermal sensitivity, using a highly fine screen in image exposure, without generating image defects, such as treatment irregularities over a long period of time, and to provide a processing method of the lithographic plate. <P>SOLUTION: The processing apparatus of the lithographic plate is provided with a spray part 53 for spraying pre-rinsing, by being jetted directly against a conveying roller 52a of the lithographic plate 12 in pre-rinsing by using a high fine screen, having 250 lines or more as an AM screen in image exposure and in which the size of the minimum pixel configuring netting points as an FM screen is 50 μm or smaller. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
