| 摘要 |
An exposure device performs a stitching exposure, i.e., exposure with shot region peripheral portions partially overlapped on a substrate (4). The exposure device includes: a concentration filter F having a light reduction section for setting the exposure light illuminance distribution to be gradually reduced in the portion corresponding to the aforementioned peripheral portions; a mask Ri; and a reduction optical system consisting of a capacitor lens system (113) and a focusing lens system (114). The reduction optical system is sandwiched between the concentration filter F and the mask Ri.
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