发明名称 SCANNING ELECTRON MICROSCOPE AND ACCELERATION VOLTAGE OPTIMIZATION METHOD IN SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To improve dimensional inspection accuracy and reproducibility of a scanning electron microscope. SOLUTION: Various electron beams 12 with accelerating voltages impressed on an electron gun 11 from an accelerating voltage impressing means 13 changed are irradiated, each secondary electron emitted thereby from a sample 16 is detected by a secondary electron detecting means 19, each contrast is detected by a contrast detecting means 22 based on the secondary electron detected, and an optimum accelerating voltage at which the contrast gets the largest is determined based on each accelerating voltage and the contrast detected. Afterwards, the electron beams 12 accelerated by the optimally accelerated accelerating voltage is irradiated on the sample 16 to carry out dimensional measurement of an actual pattern. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005251697(A) 申请公布日期 2005.09.15
申请号 JP20040064484 申请日期 2004.03.08
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 MITA ISAO
分类号 H01J37/22;H01J37/04;H01J37/28;(IPC1-7):H01J37/28 主分类号 H01J37/22
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