发明名称 Reactive metal sources and deposition method for thioaluminate phosphors
摘要 A physical vapour deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.
申请公布号 US2005202162(A1) 申请公布日期 2005.09.15
申请号 US20050072824 申请日期 2005.03.04
申请人 XU YUE (HELEN);KOSYACHKOV ALEXANDER;LIU GUO;WU XINGWEI;ACCHIONE JOE 发明人 XU YUE (HELEN);KOSYACHKOV ALEXANDER;LIU GUO;WU XINGWEI;ACCHIONE JOE
分类号 C09K11/70;C23C14/06;C23C14/34;C23C16/00;(IPC1-7):C23C16/00 主分类号 C09K11/70
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