发明名称 |
Reactive metal sources and deposition method for thioaluminate phosphors |
摘要 |
A physical vapour deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.
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申请公布号 |
US2005202162(A1) |
申请公布日期 |
2005.09.15 |
申请号 |
US20050072824 |
申请日期 |
2005.03.04 |
申请人 |
XU YUE (HELEN);KOSYACHKOV ALEXANDER;LIU GUO;WU XINGWEI;ACCHIONE JOE |
发明人 |
XU YUE (HELEN);KOSYACHKOV ALEXANDER;LIU GUO;WU XINGWEI;ACCHIONE JOE |
分类号 |
C09K11/70;C23C14/06;C23C14/34;C23C16/00;(IPC1-7):C23C16/00 |
主分类号 |
C09K11/70 |
代理机构 |
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代理人 |
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