发明名称 Semiconductor manufacturing gas flow divider system and method
摘要 A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.
申请公布号 US2005199342(A1) 申请公布日期 2005.09.15
申请号 US20040796693 申请日期 2004.03.09
申请人 SHAJII ALI;NAGARKATTI SIDDHARTH P. 发明人 SHAJII ALI;NAGARKATTI SIDDHARTH P.
分类号 C23F1/00;F17D3/00;(IPC1-7):C23F1/00 主分类号 C23F1/00
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