发明名称 FILM FORMING METHOD AND FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a film having not only characteristics corresponding to the kind of a coupling agent but also alkali resistance, and the film formed by this film forming method. SOLUTION: The film forming method has a process for forming a polyorganosiloxane film 421 mainly constituted of polyorganosiloxane, a process for applying hydroxy group introducing treatment to the polyorganosiloxane film 421 so as to cut a part of the organic group exposed to the surface of the polyorganosiloxane film 421 to introduce a hydroxy group and a process for treating the polyorganosiloxane film 421, to which the predetermined treatment is applied, with the coupling agent. The coupling agent is preferably at least one of a coupling agent having a liquid repelling functional group, a coupling agent having a liquid-philic functional group and a coupling agent having a reactive functional group. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005246707(A) 申请公布日期 2005.09.15
申请号 JP20040058227 申请日期 2004.03.02
申请人 SEIKO EPSON CORP 发明人 MIYAJIMA HIROO;MATSUO YASUHIDE
分类号 B41J2/135;B32B27/00;C09D183/04;C23C14/12;(IPC1-7):B32B27/00 主分类号 B41J2/135
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