| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface structure capable of preventing residual impurity in vacuum, in particular, remaining water molecules from being produced, while keeping acid resistance and heat resistance, in a vacuum processing chamber, such as an ALD apparatus or a CVD apparatus. SOLUTION: A hydrophobic organic high polymer film, comprising a polyimide resin film containing a fluorine atom is formed on the surface of a member 1 exposed to vacuum in a vacuum processing chamber by deposition polymerization reaction. In deposition polymerization of the polyimide resin film, a monomer, having a hydrophobic group containing a fluorine atom able to exist in isolation from a polymerization reaction, is preferably used as at least one kind of a stock monomer. COPYRIGHT: (C)2005,JPO&NCIPI
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