MEGASONIC CLEANING USING SUPERSATURATED CLEANING SOLUTION
摘要
<p>A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.</p>
申请公布号
WO2005006396(A3)
申请公布日期
2005.09.15
申请号
WO2004US18464
申请日期
2004.06.10
申请人
GOLDFINGER TECHNOLOGIES, LLC;FRANKLIN, COLE, S.;WU, YI;FRASER, BRIAN