GENERALIZATION OF THE PHOTO PROCESS WINDOW AND ITS APPLICATION TO OPC TEST PATTERN DESIGN
摘要
A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a plurality of parameters based on the simulation; (c) using the sensitivities to calculate deviations of the patterns across a range of each respective one of the parameters; and (d) selecting ones of the patterns having maximum or near-maximum deviations to be used as test patterns.
申请公布号
WO2005081910(A2)
申请公布日期
2005.09.09
申请号
WO2005US05456
申请日期
2005.02.22
申请人
PDF SOLUTIONS, INC.;EISENMANN, HANS;KAI, PETER;CIPLICKAS, DENNIS;BURROWS, JONATHAN;ZHANG ZHANG, YUNQIANG