发明名称 FLUID CONTROL APPARATUS AND HEAT TREATMENT SYSTEM
摘要 A fluid control device, comprising a flow controller (13g) in a gas line (13), a pressure control system area (14) provided on the upstream side of the flow controller (13g) in the gas line (13), and an extension part (15) extending from the upstream side end of the gas line (13) in a direction orthogonal to the gas line (13), wherein supply sources of different types of processing gases A, B, and C are connected to the extension part (15).
申请公布号 KR20050089894(A) 申请公布日期 2005.09.09
申请号 KR20037013403 申请日期 2003.02.07
申请人 TOKYO ELECTRON LIMITED 发明人 OKABE TSUNEYUKI;OKURA SHIGEYUKI
分类号 B01J4/00;C23C16/455;F16K27/00;F17D1/02;F17D1/04;G05D7/06;H01L21/02;H01L21/205;(IPC1-7):H01L21/205 主分类号 B01J4/00
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