CHARACTERIZING AN ELECTRON BEAM TREATMENT APPARATUS
摘要
In one embodiment, a method for characterizing an electron beam treatment apparatus includes: (a) e-beam treating a predetermined type of substrate utilizing at least one set of electron beam treatment parameters; (b) making postelectron beam treatment measurements of intensity of a probe beam reflected from the surface of the substrate in which thermal and/or plasma waves have been induced; and (c) developing data from the post-electron beam treatment measurements that provide insight into performance of the electron beam treatment apparatus.
